Open AccessNear-field optical property of multi-layer dielectric gratings for pulse compressor
Author(s) -
Shijie Liu,
Jing Shen,
Zicai Shen,
Kong Wei-Jin,
Chaoyang Wei,
Jin Yun-Xia,
Jianda Shao,
Fan Zheng-Xiu
Publication year - 2006
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.55.4588
Subject(s) - grating , optics , materials science , electric field , dielectric , laser , ridge , diffraction efficiency , diffraction grating , blazed grating , optoelectronics , layer (electronics) , physics , paleontology , quantum mechanics , composite material , biology
Multi-layer dielectric gratings for pulse compressor in high-energy laser system must provide high diffraction efficiency. In addition, its laser induced damage property is critical for the system. Nonuniform optical near-field distribution of multi-layer dielectric gratings is one of the important factors to limit its laser induced damage threshold. Electric field distributions in the grating region and multi-layer film region are analyzed by using Fourier modal method. Effects of grating structure on peak magnitude of electric field in grating ridge are analyzed when the top layer material is HfO2 and SiO2, respectively. The results show that there exists an optimum top layer thickness, at which the peak magnitude of electric field within grating ridge is a minimum. And the peak electric field in the grating ridge can be reduced by designing top gratings with high aspect ratio structure when top layer thickness is increasing. Finally, the peak electric field in the grating ridge can also be reduced when the multi-layer dielectric grating is used at big incident angle.