Open AccessEffect of annealing on optical properties of MgxZn1－xO thin films deposited at low temperature
Author(s) -
Xijian Zhang,
Hongjuan Ma,
Qingpu Wang,
Jin Ma,
Fujian Zong,
Hongdi Xiao,
Ji Feng
Publication year - 2006
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.55.437
Subject(s) - wurtzite crystal structure , photoluminescence , materials science , annealing (glass) , thin film , sputter deposition , full width at half maximum , grain size , analytical chemistry (journal) , optoelectronics , transmittance , sputtering , nanotechnology , composite material , metallurgy , zinc , chemistry , chromatography
MgxZn1-xO films(x=0.16) have been prepared at 80℃ by radio frequency magnetron sputtering. The effect of the annealing temperature on the structure and optical properties of the films are studied using XRD, photoluminescence and the transmittance spectra. The results indicate that the thin films have hexagonal wurtzite single phase structure and a prefered orientation with the c axis perpendicular to the substrate. With increasing annealing temperature the intensities of the XRD (002) peaks increase, the grain size and intensity of the UV photoluminescence peaks also increase, while the FWHM of (002) peaks decreases, which demonstrates that high quality MgxZn1-xO films deposited by RF magnetron sputtering can be obtained by properly controlling the annealing temperature.