Open AccessDiamond-like carbon (DLC) films deposited on copper substrate through preparation of intermediate layers
Author(s) -
Jing Wang,
Guichang Liu,
Ji Da-Peng,
Jun Xu,
Xianmo Deng
Publication year - 2006
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.55.3748
Subject(s) - materials science , raman spectroscopy , chemical vapor deposition , diamond like carbon , substrate (aquarium) , carbon film , nanoindentation , electron cyclotron resonance , sputter deposition , amorphous carbon , diamond , amorphous solid , carbon fibers , copper , analytical chemistry (journal) , sputtering , chemical engineering , thin film , nanotechnology , composite material , plasma , metallurgy , crystallography , optics , chemistry , composite number , oceanography , physics , chromatography , quantum mechanics , geology , engineering
Diamond-like carbon (DLC) films were prepared on copper substrate through preparation of intermediate layers by combined plasma enhanced sputtering physical vapor deposition and microwave electron cyclotron resonance plasma enhanced chemical vapor deposition techniques. Raman spectroscopy indicated that the films had amorphous structure and typical characteristic of DLC film. With the increase of deposition bias voltage, D and G band both shifted to high wave-number and ID/IG increased gradually. The morphology was characterized by atomic force microscopy (AFM) and the results indicated that the films were dense and homogeneous , and the roughness of the films decreased with the increase of the deposition bias voltage. Hardness and modulus of DLC were measured by the nanoindentation.