z-logo
open-access-imgOpen Access
Synthesis and characteristics of Bi3.25La0.75Ti3O12 ferroelectric thin films by sol-gel technology
Author(s) -
Hua Wang,
Ren Ming-fang
Publication year - 2006
Publication title -
acta physica sinica
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.55.3152
Subject(s) - materials science , ferroelectricity , dielectric , annealing (glass) , composite material , coercivity , microstructure , sol gel , thin film , dielectric loss , optoelectronics , condensed matter physics , nanotechnology , physics
Bi3.25La0.75Ti3O12 thin films were prepared on p-Si substrates by Sol-Gel technology. The effect of annealing temperature on microstructure, morphology, dielectric and ferroelectric properties of Bi3.25La0.75Ti3O12 films was investigated. Bi3.25La0.75Ti3O12 films annealed at 500℃ were not very uniform, they consisted of small grains and coarse grains with poor dielectric and ferroelectric properties. When the annealing temperature was over 550℃, Bi3.25La0.75Ti3O12 films were uniform and crack free as well as exhibiting no preferred orientation with good dielectric and ferroelectric properties. The leakage current density of Bi3.25La0.75Ti3O12 thin films is 2×10-8A/cm2 at 4V. A noticeable improvement of ferroelectric properties have been obtained when the annealing temperature was increased. Bi3.25La0.75Ti3O12 films annealed at 600℃ showed excellent dielectric and ferroelectric properties with a dielectric constant of 288, a dielectric loss of 1.57%, a remanent polarization of 17.5μC/cm2 and a coercive field of 102kV/cm.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom