Open AccessRoughness and light scattering properties of ZrO2 thin films deposited by electron beam evaporation
Author(s) -
Haijun Hou,
Xu Sun,
Yanming Shen,
Jianda Shao,
Zhengxiu Fan,
Kui Yao
Publication year - 2006
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.55.3124
Subject(s) - materials science , scattering , surface roughness , electron beam physical vapor deposition , surface finish , evaporation , optics , wavelength , light scattering , thin film , cathode ray , ellipsometry , electron scattering , electron , composite material , optoelectronics , nanotechnology , physics , quantum mechanics , thermodynamics
Zirconium oxide (ZrO2) coatings for 632.8nm center wavelength were deposited on the Ag layer by electron beam evaporation, optical thickness of which varied in the range of 80—480nm. Surface roughness and scattering characteristics of ZrO2 coatings with different thickness were investigated. It was found that with the gradually increase of the thickness, both roughness and total integrated scattering (TIS) of the samples decreased firstly and then increased. These results indicated that TIS of the samples mainly depended on the surface roughness. According to the uncorrelated surface roughness scattering model, scattering properties of the samples were analyzed theoretically. The calculated TIS values based on this model agreed well with that obtained by TIS measurements.