Open AccessDeep level transient spectroscopy studies of Er and Pr implanted GaN films
Author(s) -
Song Shu-Fang,
Chen Wei-De,
Zhikun Xu,
Xurong Xu
Publication year - 2006
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.55.1407
Subject(s) - materials science , annealing (glass) , deep level transient spectroscopy , conduction band , analytical chemistry (journal) , luminescence , chemical vapor deposition , spectroscopy , optoelectronics , silicon , chemistry , composite material , electron , physics , chromatography , quantum mechanics
Deep level transient spectroscopy measurements were used to characterize the ele ctrical properties of metal organic chemical vapor deposition grown undoped, Er- implanted and Pr-implanted GaN films. Only one deep level located at 0.270 eV be low the conduction band was found in the as-grown GaN films. But four defect le vels located at 0.300 eV, 0.188 eV, 0.600 eV and 0.410 eV below the conduction b and were found in the Er-implanted GaN films after annealing at 900 ℃ for 30 mi n, and four defect levels located at 0.280 eV, 0.190 eV, 0.610 eV and 0.390 eV b elow the conduction band were found in the Pr-implanted GaN films after annealin g at 1050 ℃ for 30min. The origins of the deep defect levels are discussed. Aft er annealing at 900℃ for 30min in a nitrogen flow, Er-related 1538nm luminescen ce peaks could be observed for the Er-implanted GaN sample. The energy-transfer and luminescence mechanism of the Er-implanted GaN film are described.