Open AccessOptical properties of semiconductor quantum-well material using photonic crystal fabricated by micro-fabrication machine
Author(s) -
Xu Xing-Sheng,
Zuhong Xiong,
Zhen Sun,
Wei Du,
Lin Lü,
Hongda Chen,
Aizi Jin,
Daozhong Zhang
Publication year - 2006
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.55.1248
Subject(s) - photonic crystal , materials science , focused ion beam , electron beam lithography , fabrication , optoelectronics , dry etching , reactive ion etching , photonics , etching (microfabrication) , lithography , semiconductor , crystal (programming language) , optics , nanotechnology , resist , ion , physics , alternative medicine , medicine , pathology , layer (electronics) , quantum mechanics , computer science , programming language
Two-dimensional photonic crystals in near infrared region were fabricated by using the focused ion beam (FIB) method and the method of electron-beam lithography (EBL) combined with dry etching. Both methods can fabricate perfect crystals, the method of FIB is simple,the other is more complicated. It is shown that the material with the photonic crystal fabricated by FIB has no fluorescence,on the other hand, the small-lattice photonic crystal made by EBL combined with dry etching can enhance the extraction efficiency two folds, though the photonic crystal has some disorder. The mechanisms of the enhanced-emission and the absence of emission are also discussed.