Open AccessDesign of multi-layer dielectric grating for femtosecond laser
Author(s) -
Kong Wei-Jin,
Shijie Liu,
Jing Shen,
Zicai Shen,
Jianda Shao,
Fan Zheng-Xiu
Publication year - 2006
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.55.1143
Subject(s) - materials science , optics , grating , dielectric , femtosecond , laser , duty cycle , wavelength , diffraction , stack (abstract data type) , layer (electronics) , substrate (aquarium) , groove (engineering) , optoelectronics , physics , computer science , power (physics) , oceanography , quantum mechanics , composite material , geology , metallurgy , programming language
Based on optical interference theory and Fourier modal theory, a new multi-layer dielectric gratings is designed for use in femtosecond laser system at wavelength 0.8μm. A multi-layer dielectric with stack of H3L(HL)^9H0.5L2.4H is used as a substrate to be etched with corrugated structure. Numerical computation indicates that the diffraction efficiency of -1 order can be more than 95% when the parameters of multi-layer dielectric grating are the following: laser is incident on the grating at 36.7° in TE mode, the duty cycle is 0.35 and the line density is 1480/mm, the groove depth is 0.2μm and the top residual HfO2 is 0.15μm.