Open AccessFast fabrication of large-area nanopore arrays by FIB
Author(s) -
Lei Ming Chen,
Pei Gang Li,
Xianliang Fu,
Hai Ying Zhang,
L. H. Li,
Wei Tang
Publication year - 2005
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.54.582
Subject(s) - fabrication , nanopore , materials science , nanotechnology , nanostructure , electron beam lithography , lithography , focused ion beam , resist , optoelectronics , ion , physics , layer (electronics) , medicine , alternative medicine , pathology , quantum mechanics
Fabrication of nanopore arrays is of great importance in nanodevices manufacture and basic scientific research. Focused ion beam (FIB) and electron beam lithography (EBL) have been widely used for fabrication of nanostructures.However, it takes very long time to fabricate nanostructure patterns of large area. In this p aper we report a novel fast fabrication method for nanopore arrays of large area by FIB. Each pixel of predesigned BMP file is regarded as a fabrication dot. B y matching the pixel of the presigned BMP pattern with the required fabrication area, nanopore arrays of large area can be fabricated in a very short time.