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UPS study of tri(β-naphthyl) phosphine overlayer on Ag(110)
Author(s) -
Lu Yun-Hao,
Duan Xiao-Bang,
Ping Lü,
Hanjie Zhang,
Haiyang Li,
Bao Shi-Ning,
He Pi-Mo
Publication year - 2005
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.54.4319
Subject(s) - overlayer , work function , materials science , binding energy , valence (chemistry) , phosphine , fermi level , substrate (aquarium) , x ray photoelectron spectroscopy , chemical physics , condensed matter physics , analytical chemistry (journal) , atomic physics , chemistry , nanotechnology , physics , electron , layer (electronics) , nuclear magnetic resonance , organic chemistry , catalysis , biochemistry , oceanography , quantum mechanics , chromatography , geology
Ultraviolet photoelectron spectroscopic(UPS) measurements of the tri (β-naphthyl) phosphine (TNP) film deposited on the Ag(110) surface were made. The TNP derived valence features are located at 386393and 110 eV below Fermi level, and the top of the highest occupied molecular orbital(HOMO) of TNP is located at 25 eV in binding energy. The work function of Ag(110) is about 43 eV, and upon deposition of TNP, the work function decreases to the saturated value of 38 eV. Based on the UPS measurements, the energy level alignment at the interface of TNP/Ag(110) is given, and the results indicate a weak interaction between TNP and the Ag substrate.

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