Open AccessStructural and optical properties of MgxZn1-xO thin films deposited by radio frequency magnetron sputtering
Author(s) -
Xijian Zhang,
Honglei Ma,
Qingpu Wang,
Jin Ma,
Fujian Zong,
Hongdi Xiao,
Ji Feng
Publication year - 2005
Publication title -
acta physica sinica
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.54.4309
Subject(s) - materials science , wurtzite crystal structure , lattice constant , sputter deposition , band gap , thin film , substrate (aquarium) , transmittance , analytical chemistry (journal) , sputtering , diffraction , optoelectronics , optics , chemistry , nanotechnology , physics , metallurgy , zinc , oceanography , chromatography , geology
MgxZn1-xO films(0≤x≤030) have been prepared on sap phire substrates by radio frequency magnetron sputtering at a substrate tempera ture of 80℃. Optical and structural properties of the MgxZn1-x O films were studied using transmittance and x-ray diffraction (XRD)spect ra. XRD patterns indicate that the MgxZn1-xO films have he xagonal wurtzite single-phase structure of ZnO and a preferred orientation with the c-axis perpendicular to the substrates without any significant formation o f a separated MgO phase. The c-axis lattice constant of the MgxZn1-xO films decreases gradually with increasing Mg content. Sharp absorp tion edge appeared in the transmittance spectra of the MgxZn1-x O films, the fundamental band gap of the MgxZn1-xO f ilms were estimated, which increases almost linearly from 3.32 eV at x=0 to 3.9 6 eV at x=030
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