Open AccessFabrication of graphite nano-structures
Author(s) -
Liu Shou-Peng,
Feng Zhou,
Aizi Jin,
Hang Yang,
Ma Yong-Jun,
Hui Li,
Changzhi Gu,
Lyu Li,
Bo Jiang,
Zheng Quan-Shui,
Sheng Wang,
Peng Lian-Mao
Publication year - 2005
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.54.4251
Subject(s) - graphite , materials science , fabrication , nano , etching (microfabrication) , lithography , electron beam lithography , cleavage (geology) , focused ion beam , reactive ion etching , nanotechnology , ion beam , ion , beam (structure) , composite material , optoelectronics , resist , optics , layer (electronics) , chemistry , medicine , alternative medicine , organic chemistry , physics , pathology , fracture (geology)
Nano-sized graphite patterns were obtained by tailoring graphite sheets using different methods. With focused ion beam etching we are able to produce grooves of minimum width 30 nm. However, at the edges of the grooves there deposit with Ga-C compound which prevents the easy cleavage of the graphite sheets. With electron beam lithography and reactive ion etching techniques we are able to produce graphite patterns of sizes down to 50 nm. Three different types of masks are tested, and the results are compared and discussed.