Open AccessAnalysis of atom focusing for nanostructure fabrication with a completely off-resonant optical standing wave
Author(s) -
Xianzhong Chen,
Hongbao Yao,
Xunan Chen
Publication year - 2005
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.54.2645
Subject(s) - nanostructure , atom (system on chip) , standing wave , fabrication , optics , beam (structure) , physics , laser , thermal , laser beams , materials science , field (mathematics) , lithography , atomic physics , ray tracing (physics) , nanotechnology , computer science , medicine , alternative medicine , mathematics , pathology , pure mathematics , embedded system , meteorology
The focusing of a thermal atomic beam to nanometer_scale dimensions can be rea lized by a completely off_resonant standing_wave laser field, which can decrease the difficulty of atom lithography experiments. The effects of atom source on a tom focusing are analyzed using the Monte_Carlo scheme and trajectory tracing me thod, and the simulation results have shown that the effective size of the targe t has a much more important effect on feature width than beam spread and longitu dinal velocity spread. Several methods for improving experiments are presented.