Analysis of atom focusing for nanostructure fabrication with a completely off-resonant optical standing wave | Zendy

Xianzhong Chen | Zendy; Hanmin Yao | Zendy; Xunan Chen | Zendy

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Analysis of atom focusing for nanostructure fabrication with a completely off-resonant optical standing wave

Author(s) -

Xianzhong Chen,

Hanmin Yao,

Xunan Chen

Publication year - 2005

Publication title -

acta physica sinica

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.199

H-Index - 47

ISSN - 1000-3290

DOI - 10.7498/aps.54.2645

Subject(s) - nanostructure , atom (system on chip) , standing wave , fabrication , optics , beam (structure) , physics , laser , thermal , laser beams , materials science , field (mathematics) , lithography , atomic physics , ray tracing (physics) , nanotechnology , computer science , medicine , alternative medicine , mathematics , pathology , pure mathematics , embedded system , meteorology

The focusing of a thermal atomic beam to nanometer_scale dimensions can be rea lized by a completely off_resonant standing_wave laser field, which can decrease the difficulty of atom lithography experiments. The effects of atom source on a tom focusing are analyzed using the Monte_Carlo scheme and trajectory tracing me thod, and the simulation results have shown that the effective size of the targe t has a much more important effect on feature width than beam spread and longitu dinal velocity spread. Several methods for improving experiments are presented.

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