Open AccessAnalysis of reflection high-energy electron diffraction pattern during SrTiO3 homoepitaxy
Author(s) -
Xianhua Wei,
Ying Zhang,
Jinlong Li,
Xiaojun Deng,
Xingzhao Liu,
Shuwen Jiang,
Jun Zhu,
Yanrong Li
Publication year - 2005
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.54.217
Subject(s) - reflection high energy electron diffraction , electron diffraction , molecular beam epitaxy , full width at half maximum , materials science , diffraction , gas electron diffraction , oscillation (cell signaling) , optics , annealing (glass) , reflection (computer programming) , electron , epitaxy , condensed matter physics , physics , chemistry , optoelectronics , nanotechnology , biochemistry , layer (electronics) , composite material , computer science , programming language , quantum mechanics
SrTiO3 surface was monitored in-situ by reflection high-energy electron diffraction(RHEED) during annealing and homoepitaxial growth in laser molecular beam epitaxy(LMBE). By analyzing RHEED pattern, we show the oscillation behavior of in-plane lattice constant and full-width at half maximum (FWHM) of diffraction streaks; the former is due to the interface between the annealed reconstruction surface and the growing film, and the origin of the latter is related to the relaxation of 2D islands by their edges. In addition, the phase shift of RHEED intensity oscillation was observed, due to plasma influence on the incident electron beam.