Open AccessStudy of microcrystalline silicon solar cells fabricated by very high frequency plasma-enhanced chemical vapor deposition
Author(s) -
Xiaodan Zhang,
Ying Zhao,
Yachen Gao,
Feng Zhu,
Changchun Wei,
Jian Sun,
Yan Wang,
Xin Geng,
Xiong Shao-Zhen
Publication year - 2005
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.54.1899
Subject(s) - microcrystalline silicon , plasma enhanced chemical vapor deposition , materials science , chemical vapor deposition , plasma , microcrystalline , silicon , optoelectronics , chemical engineering , crystalline silicon , amorphous silicon , chemistry , physics , quantum mechanics , engineering , crystallography
Microcrystalline silicon solar cells with the variation of silane concentration (SC) and discharge power were fabricated by very high frequency plasma_enhanced chemical vapor deposition. The results of J_V measurements showed that open circuit voltage (Vococ) of solar cells decreases with the decr ease of silane concentration and the increase of power in the range of experiments. I nfluence of SC on short_circuit current density (Jscsc) is more evi dent than power. As for microcrystalline silicon solar cells, the optimum choice for N layer is amorphous, because it can decrease the lateral collection effect of current on the one hand and increase the fill factor on the other hand.