Open AccessStudies on C22 radical by optical emission spectroscopy in an induc tively-coupled CF44/CH44 plasma
Author(s) -
Haiyan Song,
Xin Yu,
NingZhao-Yuan
Publication year - 2005
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.54.1653
Subject(s) - radical , plasma , spectroscopy , inductively coupled plasma , analytical chemistry (journal) , materials science , chemistry , atomic physics , physics , organic chemistry , quantum mechanics
In this paper, actinometric optical emission spectroscopy (AOES) is used to inve stigate the discharge of CF44 and CH44 mixtures. Relat ive concentratio ns of radicals in an inductively_coupled plasma are determined as functions of rf input power, pressure and the gas flow ratio R (R=CH44/{CH 44+CF44}). It is found that CFCF22 CHH and F radicals exis t in the CF44/CH44 plasma as well as C22 radical. The relative co ncentration of C22 increases with increasing power, and shows a rev erse “U” shape tendency with increasing pressure. As R increases, the variati on of the relative concentration of C22 is not monotonical. It reac hes a ma ximum value when 75%, then decreases followed by almost no change with the further increase of R. Based on these results, it is concluded that gas_pha se reaction from the reaction of CF and CH →2 contribu tes to the production of C22 radical. At the same time, activation reaction model of radical collision is suggested. Result of simulation agrees well with that of experiment.