Open AccessThe model of the magnetic mirror effect in the unbalanced magnetron sputtering ion beams
Author(s) -
Mu Zong-Xin,
Guoqing Li,
Fuwen Qin,
Huang Kai-yu,
Che De-Liang
Publication year - 2005
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.54.1378
Subject(s) - materials science , sputter deposition , argon , cavity magnetron , ion , atomic physics , plasma , sputtering , saturation (graph theory) , solenoid , physics , nuclear physics , thin film , nanotechnology , mathematics , quantum mechanics , combinatorics
A conventional magnetron and a coaxial electrosolenoid were used to construct an unbalanced magnetron sputtering deposition system for investigating its properties. At 02Pa, argon gas discharging, a shielded planar ioncollecting electrode was taken to measure the saturation ion beam flux density at the different axial positions. The saturation ion flux reached about 9mA/cm2. The magnetohydrodynamics was applied to analyse the influences of the magnetic mirror effect on the discharge properties caused by the solenoid. As a result, the comparisons of the theoretical calculations with the experiments indicated that the model described correctly the plasma properties in the unbalanced magnetron sputtering system.