Open AccessPreservation dose of helium-implanted in nanocrystal titanium films
Author(s) -
Zheng Si-xiao,
Siyi Luo,
Zhongyang Liu,
Xinggui Long,
Peilu Wang,
Peng Shuming,
Xiaodong Liu,
Ning Liu
Publication year - 2004
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.53.555
Subject(s) - nanocrystal , helium , materials science , titanium , ion implantation , proton , analytical chemistry (journal) , nanotechnology , ion , atomic physics , chemistry , metallurgy , nuclear physics , physics , chromatography , organic chemistry
Helium concentration profile, preservation dose and release rate from a nanocrystal titanium film implanted with helium at different energy and dose have been measured by proton Rutherford backscattering technique in a range from room temperature to 500℃. It is observed that the implanted helium may be stably preserved for a long time in the nanocrystal titanium film in the temperature environment from room temperature to below 100℃ when its concentration in up to 41%—52% of He-Ti atomic ratio, and also may be effectively preserved for a long time at room temperature if their atomic concentration ratio is up to 52%—74%. Possible mechanism of helium effectively preserved in the nanocrystal film with a large boundary volume ratio is preliminarily discussed from the energy viewpoint in this paper.