Open AccessPreparation of titanium nitride films by pulsed high-energy-density plasma and investigation of the tribological behavior of the film
Author(s) -
YF Liu,
GL Zhang,
Wang Jl,
CZ Liu,
Sz Yang
Publication year - 2004
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.53.503
Subject(s) - materials science , microstructure , x ray photoelectron spectroscopy , scanning electron microscope , auger electron spectroscopy , titanium nitride , tribology , substrate (aquarium) , composite material , nitride , titanium , energy dispersive x ray spectroscopy , thin film , layer (electronics) , metallurgy , chemical engineering , nanotechnology , oceanography , physics , nuclear physics , engineering , geology
Supper hard and wear resistant titanium nitride films were deposited onto 0.45% carbon steel substrate by pulsed high-energy-density plasma(PHEDP) technique at ambient temperature. The microstructure, surface compositions and depth profile of the film were analyzed by x-ray diffraction (XRD), x-ray photoelectron spectroscopy (XPS), Auger electron spectroscopy (AES) and scanning electron microscopy (SEM).The hardness profile and tribological behavior of the film were determined with nano-indenter and MM200 wear tester, respectively. The results showed that the microstructure of the film was dense and uniform and mainly composed of titanium nitride phases. A wide mixing interface existed between the film and the substrate. The film possessed a very high value of nanohardness. The wear resistance of the film was excellent and the value of the friction coefficient of the film was low under dry sliding wear test conditions.