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Characteristics of two-electron-temperature in inductively coupled CF4 plasmas
Author(s) -
Haiyan Song,
Ning Zhao-Yuan,
Xiao Yu,
Gan Zhao-Qiang
Publication year - 2004
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.53.3394
Subject(s) - electron temperature , langmuir probe , electron , plasma , atomic physics , inductively coupled plasma , electron density , materials science , physics , plasma diagnostics , nuclear physics
The characteristics in low-pressure inductively coupled CF4 plasma have been-inv estigated using a Langmuir probe method. Results for the CF4 gas have shown that there are two electron populations: one with low temperature and high densit y and the second w ith higher temperature and lower density, in this region. Fast electron temperat ure The, slow electron temperature Tceand mean electron tem perature Te decrease , while their densities nhe,nce, ne increase with in creasing r.f. input pow er. Our findings suggest that the dependence of two-electron-temperature on r. f.input power can be explained by the thermodynamic equilibrium of the collision between electrons and particles.

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