Open AccessTarget ablation characteristics during pulsed laser deposition of thin films
Author(s) -
Zhang Duan-Ming,
Hou Si-Pu,
Li Guan,
Zhong Zhi-Cheng,
Zhihua Li,
Feifei Yang,
Zheng Ke-Yu
Publication year - 2004
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.53.2237
Subject(s) - materials science , pulsed laser deposition , thin film , ablation , laser ablation , deposition (geology) , optoelectronics , laser , optics , nanotechnology , aerospace engineering , physics , paleontology , sediment , engineering , biology
The whole ablation process of target heated by pulsed lasers is studied in this paper. Under the appropriate dynamic boundary conditions, have been investigated in detail the heat flow equation with heat generation term, and the temperature distribution of target before and after the melting. In particular, after target melting, the temperature distribution and the interface position between the solid and liquid phases as functions of time are presented in the solution of analytical expressions. Additionally, under the energy balance conditions, the dependence of the ablating surface position on the time is investigated. Consequently, the ablation of target Si has been calculated. This research shows a positive result compared with the relevant experiments.