Open AccessStudy on optical properties of diamond films by means of infrared spectroscopic ellipsometry
Author(s) -
Hui Shen,
Linjun Wang,
Zhijun Fang,
Minglong Zhang,
Ying Yang,
Lin Wang,
Yiben Xia
Publication year - 2004
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.53.2009
Subject(s) - diamond , materials science , chemical vapor deposition , ellipsometry , refractive index , infrared , layer (electronics) , microwave , deposition (geology) , optics , thin film , analytical chemistry (journal) , optoelectronics , nanotechnology , composite material , chemistry , physics , paleontology , chromatography , quantum mechanics , sediment , biology
We have made spectroscopic ellipsometric measurement to characterize the structure of diamond films in infrared region (2.5—12.5μm). These films are grown respectively by microwave plasma chemical vapor deposition (MPCVD) and hot filament chemical vapor deposition (HFCVD). It is found that the establishment of appropriate models has the strongest influence on the fit of ellipsometric spectra. The best fit is achieved for MPCVD film with a 77.5nm middle layer of SiO2, and for HFCVD film with a 879nm rough surface layer included by Bruggeman effective medium approximation. Finally, the refractive index (n) and the extinctive coefficient (k) are calculated for both films, which show that the film grown by MPCVD is optically better than by HFCVD apparently.