Open AccessRaman analysis of microstructure of polycrystalline silicon films deposited at low-temperatures from SiCl4-H2
Author(s) -
Xuelian Lin,
Chuangjun Huang,
Kaifeng Lin,
Yunpeng Yu,
Chao Yu,
Huang Rui
Publication year - 2004
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.53.1558
Subject(s) - materials science , microstructure , raman spectroscopy , silicon , polycrystalline silicon , crystallite , composite material , optoelectronics , optics , metallurgy , thin film transistor , physics , layer (electronics)