Open AccessRaman analysis of microstructure of polycrystalline silicon films deposited at low-temperatures from SiCl4-H2
Author(s) -
Xuanying Lin,
Chuangjun Huang,
Lin Kui-Xun,
Yunpeng Yu,
Yu Chu-Ying,
Rui Huang
Publication year - 2004
Publication title -
acta physica sinica
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.53.1558
Subject(s) - materials science , microstructure , raman spectroscopy , silicon , polycrystalline silicon , crystallite , composite material , optoelectronics , optics , metallurgy , thin film transistor , physics , layer (electronics)
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