Open AccessParametric study of plasma resistance in gas pulsed discharges
Author(s) -
Gang Chen,
Pan Bai-Liang,
Zhixin Yao
Publication year - 2003
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.52.1635
Subject(s) - plasma , buffer gas , materials science , voltage , gas pressure , atomic physics , parametric statistics , electric discharge in gases , current (fluid) , plasma parameters , analytical chemistry (journal) , mechanics , thermodynamics , chemistry , physics , optics , chromatography , laser , statistics , mathematics , quantum mechanics , petroleum engineering , engineering
The dependences of dynamic plasma resistances on discharge voltage, repetitive frequency and buffer gas pressure are studied and measured. It is found that the plasma resistance reduced with the increase of discharge voltage and repetit ive frequency, but increased with enhancing buffer gas pressure. The experimenta l formula of plasma resistance depending on discharge voltage, repetitive freque ncy and buffer gas pressure was proposed and the pulsed discharge current was si mulated using the experimental formula of plasma resistance.