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Ultra violet photoluminescenc of ZnO films on different substrates
Author(s) -
Deheng Zhang,
Qingpu Wang,
Xue Zhong-ying
Publication year - 2003
Publication title -
acta physica sinica
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.52.1484
Subject(s) - materials science , photoluminescence , sapphire , crystallite , crystallinity , annealing (glass) , ultraviolet , optoelectronics , excited state , sputter deposition , quartz , electron , analytical chemistry (journal) , sputtering , thin film , optics , nanotechnology , atomic physics , chemistry , laser , physics , quantum mechanics , chromatography , metallurgy , composite material
Polycrystalline ZnO films with a good preferred orientation were deposited on sapphire, Si and quartz substrates by rf magnetron sputtering. A 356 nm Ultraviolet (UV) photoluminescence (PL) peak and a 446 nm blue peak were observed at room temperature when excited with 270 nm light. After high-temperature annealing in oxygen, the crystallinity of the films was improved. The intensity of the UV emission increased by 7 and 14 times, respectively, for the films on sapphire and quartz substrates respectively. We conclude that the UV emission originates from the inter-band transition of electrons and the blue emission is due to the transition of electrons from the shallow donor level of the oxygen vacancies to the valence band.

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