z-logo
open-access-imgOpen Access
Magnetic properties and rectifying behaviour of silicon doped with gadolinium
Author(s) -
Jianping Zhou,
Nuofu Chen,
Song Shulin,
Chunlin Chai,
Shaoyan Yang,
Zhikai Liu,
Lin Lanying
Publication year - 2003
Publication title -
acta physica sinica
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.52.1469
Subject(s) - gadolinium , materials science , silicon , doping , condensed matter physics , magnetic moment , magnet , atom (system on chip) , magnetoresistance , magnetism , ion , rkky interaction , nuclear magnetic resonance , magnetic field , optoelectronics , ferromagnetism , physics , metallurgy , quantum mechanics , computer science , embedded system
The magnetic/nonmagnetic p-n junction was prepared by implanting gadolinium into the n-type silicon with low-energy dual-ion-beam epitaxy technology.The magnet ic layer GdxSi1-x shows excellent magnetic properties at r oom temperature. High magnetic moment 10μB per Gd atom is observed, which is interpreted by RKKY mechanism. Magnetic/nonmagnetic p-n junctions show rectifying behaviour, but no magnetoresistance is observed.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom