Open Access快速热退火和氢等离子体处理对富硅氧化硅薄膜微结构与发光的影响
Author(s) -
Yongqian Wang,
Chen Wei-De,
Changyong Chen,
Hongwei Diao,
Zhang Shi-Ben,
Xu Yan-Yue,
Guanglin Kong,
Xin Liao
Publication year - 2002
Publication title -
wuli xuebao
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.51.1564
Subject(s) - computer science