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快速热退火和氢等离子体处理对富硅氧化硅薄膜微结构与发光的影响
Author(s) -
Yongqian Wang,
Chen Wei-De,
Changyong Chen,
Hongwei Diao,
Zhang Shi-Ben,
Xu Yan-Yue,
Guanglin Kong,
Xianbo Liao
Publication year - 2002
Publication title -
acta physica sinica
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.51.1564
Subject(s) - computer science

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