STUDY ON THE ENHANCEMENT MECHANISMS OF AN OPTIMIZED COPPER VAPOR LASER | Zendy

CHENG CHENG | Zendy; ZHUANG FEI | Zendy

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STUDY ON THE ENHANCEMENT MECHANISMS OF AN OPTIMIZED COPPER VAPOR LASER

Author(s) -

CHENG CHENG,

ZHUANG FEI

Publication year - 2001

Publication title -

acta physica sinica

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.199

H-Index - 47

ISSN - 1000-3290

DOI - 10.7498/aps.50.478

Subject(s) - materials science , capacitance , lasing threshold , laser , plasma , optoelectronics , electrical impedance , electron , copper vapor laser , impedance matching , copper , electrode , optics , chemistry , electrical engineering , physics , wavelength , quantum mechanics , metallurgy , engineering

The enhancement mechanism of the optimized CVL by a genetic algorithm are presented in this paper. With a small storage capacitance and a small peaking capacitance, the input power increases due to the improved impedance matching between the laser head and the discharging LC circuit by the optimization. The lasing population increases as a result of the increased tube-wall temperature. The plasma electron temperature increases more rapidly during the period of the discharge, and the electron density increases obviously after the optimization.

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