Open AccessSTUDY ON THE ENHANCEMENT MECHANISMS OF AN OPTIMIZED COPPER VAPOR LASER
Author(s) -
CHENG CHENG,
ZHUANG FEI
Publication year - 2001
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.50.478
Subject(s) - materials science , capacitance , lasing threshold , laser , plasma , optoelectronics , electrical impedance , electron , copper vapor laser , impedance matching , copper , electrode , optics , chemistry , electrical engineering , physics , wavelength , quantum mechanics , metallurgy , engineering
The enhancement mechanism of the optimized CVL by a genetic algorithm are presented in this paper. With a small storage capacitance and a small peaking capacitance, the input power increases due to the improved impedance matching between the laser head and the discharging LC circuit by the optimization. The lasing population increases as a result of the increased tube-wall temperature. The plasma electron temperature increases more rapidly during the period of the discharge, and the electron density increases obviously after the optimization.