Open AccessSTUDY ON THE MECHANISM OF THE DEPOSITON PROCESS OF KTN THIN FILM BY PULSED LASER
Author(s) -
Zhihua Li,
Zhang Duan-Ming,
Zhongjun Chen,
Huang Ming-Tao,
Li Guan,
Zhong Zhi-Cheng,
Guodong Li
Publication year - 2001
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.50.1950
Subject(s) - materials science , plasma , laser , pulsed laser deposition , ablation , thin film , laser ablation , wavelength , irradiation , optics , optoelectronics , nanotechnology , physics , engineering , quantum mechanics , aerospace engineering , nuclear physics
According to energy balance consideration, the ablation ratio formula of target irradiated by pulsed laser is derived, and the spatial-characteristic equations of plasma generated by pulsed laser are obtained by using fluid dynamic theory. Combining the ablation ratio formula with the spatial-characteristic equations of plasma, the effects of different laser power density and wavelength on the deposition characteristics of Kta0.65Nb0.35O3(KTN) thin film are studied on the basis of our experiments. And many valuable results are obtained which have been discussed in detail. The calculated results are in agreement with experiments on the whole.