INVESTIGATIONS OF TiO2 FILMS PREPARED BY REACTIVE MAGNETRON SPUTTERING | Zendy

Kun Zhao | Zendy; Zhu Feng | Zendy; Lifang Wang | Zendy; Meng Tie-Jun | Zendy; Baocheng Zhang | Zendy; Kang Zhao | Zendy

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INVESTIGATIONS OF TiO2 FILMS PREPARED BY REACTIVE MAGNETRON SPUTTERING

Author(s) -

Kun Zhao,

Zhu Feng,

Lifang Wang,

Meng Tie-Jun,

Baocheng Zhang,

Kang Zhao

Publication year - 2001

Publication title -

acta physica sinica

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.199

H-Index - 47

ISSN - 1000-3290

DOI - 10.7498/aps.50.1390

Subject(s) - anatase , materials science , rutile , thin film , annealing (glass) , sputtering , sputter deposition , partial pressure , cavity magnetron , substrate (aquarium) , chemical engineering , high power impulse magnetron sputtering , optoelectronics , composite material , nanotechnology , oxygen , chemistry , photocatalysis , engineering , biochemistry , oceanography , organic chemistry , geology , catalysis

TiO2 thin films were prepared by reactive magnetron sputtering.The influences of O2 partial pressure,substrate temperature and annealing temperature on the structural properties of the films have been studied.In these films anatase and rutile phases were observed and their respective preferred crystallizing conditions were analyzed.In this paper,the morphological characteristic of TiO2 film was also discussed.

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