Open AccessINVESTIGATIONS OF TiO2 FILMS PREPARED BY REACTIVE MAGNETRON SPUTTERING
Author(s) -
Zhao Kun,
Feng Zhu,
Lifang Wang,
Meng Tao,
Baocheng Zhang,
Kui Zhao
Publication year - 2001
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.50.1390
Subject(s) - anatase , materials science , rutile , thin film , annealing (glass) , sputtering , sputter deposition , partial pressure , cavity magnetron , substrate (aquarium) , chemical engineering , high power impulse magnetron sputtering , optoelectronics , composite material , nanotechnology , oxygen , chemistry , photocatalysis , engineering , biochemistry , oceanography , organic chemistry , geology , catalysis
TiO2 thin films were prepared by reactive magnetron sputtering.The influences of O2 partial pressure,substrate temperature and annealing temperature on the structural properties of the films have been studied.In these films anatase and rutile phases were observed and their respective preferred crystallizing conditions were analyzed.In this paper,the morphological characteristic of TiO2 film was also discussed.