Open AccessINFLUENCE OF ION ENERGY AND DEPOSITION TEMPERATURE ON THE SURFACE MORPHOLOGY OF CARBON FILMS DEPOSITED BY ION BEAMS
Author(s) -
Meiyong Liao,
Qin Fuguang,
Chunlin Chai,
Zhikai Liu,
YANG SHAO-YAN,
Zhenyu Yao,
Zhanguo Wang
Publication year - 2001
Publication title -
acta physica sinica
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.50.1324
Subject(s) - materials science , ion , carbon fibers , graphite , substrate (aquarium) , carbon film , ion beam , ion beam assisted deposition , deposition (geology) , diamond , perpendicular , analytical chemistry (journal) , thin film , composite material , nanotechnology , chemistry , paleontology , oceanography , geometry , mathematics , organic chemistry , chromatography , sediment , composite number , biology , geology
Carbon films were deposited by mass-selected ion beam technique with ion energies 50—200eV at a substrate temperature from room temperature to 800℃. For the energies used, smooth diamond-like carbon films were deposited at room temperature. When the substrate temperature was 600℃,rough graphitic films were produced. But highly oriented carbon tubes were observed when the energies were larger than 140eV at 800℃. They were perpendicular to the surface and parallel to each other. Preferred orientation of graphite basic plane was observed by high-resolution electron microscopy. Shallow ion implantation and stress are responsible for this orientation.
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