
STUDY ON THE ADSORPTION MECHANISM OF GASEOUS MOLECULES ON SURFACE OF SEMICONDUCT OR BY PHOTOVOLTAIC METHOD
Author(s) -
Yongsheng Yan,
Sun Yi-Yang,
Xiaoyong Ding,
Yiming Chen
Publication year - 2000
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.49.2448
Subject(s) - wafer , adsorption , photovoltaic system , materials science , chemical physics , molecule , surface (topology) , photovoltaic effect , mechanism (biology) , silicon , molecular physics , optoelectronics , chemistry , physics , quantum mechanics , organic chemistry , mathematics , geometry , ecology , biology
The relative surface parameters were determined by photovoltaic method in p and n type silicon in a wafer under the atmospheric, oxygenic, and nitric environmen ts, respectively. The inherent mechanism is approached according to the paramete r variations, and the relative physical phenomena are explained.