Open AccessEFFECT OF NITROGEN ON THE RESIDUAL STRESS AND ADHESION OF DIAMOND-LIKE AMORPHOUS CARBON NITRIDE FILMS
Author(s) -
Jianhua Ju,
Yiben Xia,
Weili Zhang,
Linjun Wang,
Weimin Shi,
Huang Zhi-ming,
Zhifeng Li,
ZHENG GUO-ZHEN,
Dewei Tang
Publication year - 2000
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.49.2310
Subject(s) - materials science , amorphous carbon , diamond like carbon , residual stress , auger electron spectroscopy , nanoindentation , carbon film , composite material , amorphous solid , chemical vapor deposition , carbon nitride , diamond , nitride , carbon fibers , substrate (aquarium) , plasma enhanced chemical vapor deposition , thin film , nanotechnology , composite number , layer (electronics) , crystallography , chemistry , physics , biochemistry , oceanography , photocatalysis , geology , nuclear physics , catalysis
Microstructure and adhesion properties of nitrogen-doped diamond-like amorphous carbon (DLC) film deposited by r f plasma-enhanced chemical vapor deposition method is studied by atomic force microscope, Auger electron spectroscopy (AES) and micro-indentation analysis. Results show that, with the increase of nitrogen content, particles of tens of nanometer in size appear in the film. The atomic lateral force microscope and AES analyses show that these nano particles are nitrogen-rich amorphous carbon nitride CNx, where x is larger than 0.126. Micro-indentation measurement shows that this DLC/CNx nano-composite structure reduces the residual stress of the film and improves the adhesion between DLC film and Si substrate.