
Si(111)表面在NH3气氛下形成Si3N4薄膜的STM研究
Author(s) -
翟光杰,
杨建树,
陈显邦,
王学森
Publication year - 2000
Publication title -
wuli xuebao
Language(s) - Uncategorized
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.49.215
Subject(s) - materials science , silicon nitride , physics , silicon , optoelectronics