Open AccessSTUDY ON ELECTROCHROMIC PERFORMANCES AND MECHANISM OF MICROCRYSTAL NiOxHy THIN FILMS FABRICATED BY R.F.DEPOSITION
Author(s) -
Bin Feng,
Xie Liang,
Jun Wang,
Jiang Shengrui,
Guanghua Chen
Publication year - 2000
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.49.2066
Subject(s) - electrochromism , materials science , non blocking i/o , thin film , ion , stoichiometry , analytical chemistry (journal) , nanotechnology , chemistry , catalysis , electrode , organic chemistry
In this article,the electrochromic (EC) properties of R.F.deposited NiOx thin films are investigated.It was found that non-stoichiometric NiOx(x>1) thin films which are rich in O element have EC activation.In NiOx thin films exist both Ni3+ and Ni2+ ions.The insert ion of H+ ions and their sequential occupation of Ni vacation render t2g energy levels of Ni3 ions completely filled.Thus,Ni3+ is reduce to Ni2+ ions and the NiOx films get light transparent.On the contrary,the extraction of H+ ions from NiO x films will produce vacancies in the tg energy levels o f Ni.Ni2+ ions are oxidized to Ni3+ ions,wh ich makes NiOx films absorb light.The film is then colored.