Open AccessEFFECTS OF DEPOSITION TEMPERATURE ON ELECTRICAL PROPERTIES OF HYDROGENATED AMORP HOUS CARBON FILMS
Author(s) -
Cheng Shan-Hua,
Ning Zhao-Yuan,
Kan Jian,
Cheng Ma,
Chao Ye
Publication year - 2000
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.49.2041
Subject(s) - materials science , raman spectroscopy , amorphous carbon , electrical resistivity and conductivity , deposition (geology) , carbon film , plasma , carbon fibers , substrate (aquarium) , amorphous solid , analytical chemistry (journal) , chemical engineering , thin film , nanotechnology , composite material , optics , chemistry , environmental chemistry , organic chemistry , composite number , oceanography , engineering , biology , paleontology , quantum mechanics , physics , sediment , electrical engineering , geology
Hydrogenated amorphous carbon films were deposited using ECR plasma with benzene as carbon source at varying substrate temperature. The effects of deposition te mperature on the resistivity and the intensity of electric break down have been investigated. The results show these properties depend on their growth condition s. The experiment results are further investigated using Raman spectra analysis.