Open AccessSTUDING ON ELECTROMAGNETIC CHARACTERS OF Fe/Al2O3/Fe TUNNE LING JUNCTIONS
Author(s) -
Liu Cun-Ye,
Xu Qing-Yu,
Gang Ni,
H. Sang,
Du You-Wei
Publication year - 2000
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.49.1897
Subject(s) - materials science , magnetoresistance , x ray photoelectron spectroscopy , microstructure , quantum tunnelling , chemical composition , sputtering , conductance , spectroscopy , condensed matter physics , analytical chemistry (journal) , nuclear magnetic resonance , thin film , optoelectronics , nanotechnology , composite material , magnetic field , chemistry , physics , quantum mechanics , organic chemistry , chromatography
Using ion-beam-sputtering technique, Fe/Al2O3/Fe magnetic tunneling junctions (MTJ) were fabricated. Tunneling magnetoresistance (TMR) eff ect of MTJ samples has been successfully studied. The chemical composition and t he microstructural characteristics of hard-and soft-magnetic layers, insulating layer, and interface of MTJ were analyzed by X-ray photoelectron spectroscopy an d Atomic force microscopy. The dependence of MR effect on microstructure, chemic al composition, conductance, and - characteristic of the samples are also di scussed.