Open AccessPHOTOCHEMICAL REACTION ON ITO SURFACE INDUCED BY SOFT X-RAY IRRADIATION
Author(s) -
Liming Liu,
Yuqing Xiong,
Yun Guo,
Guanbin Li,
DeQuan Yang
Publication year - 2000
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.49.1883
Subject(s) - x ray photoelectron spectroscopy , irradiation , x ray , dissociation (chemistry) , photochemistry , materials science , soft x rays , spectral line , chemical state , chemical reaction , chemistry , analytical chemistry (journal) , optics , physics , nuclear magnetic resonance , laser , chromatography , nuclear physics , biochemistry , astronomy
ITO surface photochemical reaction induced by soft X-ray (Mg Kα=125360eV) irr adiation is investigated in-situ by XPS technique. The result shows that the con tent of In and Sn in the irradiated area goes up with the increasing irradiation time, while that of O falls. The changes of In3d, Sn3d XPS spectra and the Auge r Parameter of In, Sn suggest that there is chemical reaction due to X-ray irrad iation. It can be concluded that more photo-dissociation happens to In element a ccording to the obvious fact that there exists sub-oxidized state of In after ex posure to X-ray. The photochemical reaction mechanism induced by soft X-ray irra diation is discussed.