Open AccessTOPMOST SURFACE AND GROWTH MECHANISM OF BaTiO3 THIN FILM GROWN BY LAS ER MOLECULAR BEAM EPITAXY
Author(s) -
Cui Dafu,
Chen Fan,
Zhao Tong,
Shi Wen-Sheng,
Zhenghao Chen,
Zhou Yue-Liang,
Lv Hui-Bin,
Yang Guo-Zhen,
Huang Hui-Zhong,
Hongxia Zhang
Publication year - 2000
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.49.1878
Subject(s) - reflection high energy electron diffraction , materials science , molecular beam epitaxy , electron diffraction , thin film , epitaxy , x ray photoelectron spectroscopy , substrate (aquarium) , laser , layer (electronics) , optics , diffraction , nanotechnology , nuclear magnetic resonance , physics , oceanography , geology
The BaTiO3 thin film was grown epitaxially on SrTiO3(001) substrate by laser molecular beam epitaxy (laser-MBE). The film growth process w as monitored by in situ reflection high-energy electron diffraction (RHEED), the regular RHEED intensity oscillation from the 0th-Bragg reflection shows an unit cell layer-by-layer growth mode. The crystalline structure and the surface morp hology of the laser-MBE BaTiO3 film were characterized by X-ray diffr action (XRD) and by atomic force microscopy (AFM), respectively. The XRD and AFM results show that laser-MBE BaTiO3 film exhibit the tetragonal c-axi s oriented structure and an atomically smooth surface with a root mean square su rface roughness of 016nm. The topmost surface of the film was studied by angl e-resolved X-ray photoelectron spectroscopy (ARXPS), indicating the laser-MBE Ba TiO3 film is predominantly terminated with TiO2 atomic pla ne. The topmost surface of laser-ablated BaTiO3 film was also analyze d. The film growth mechanism was investigated in atomic scale.