Open AccessEffect of High－Temperature Treatment on the Crystallization of CNx Thin Films
Author(s) -
Xingcheng Xiao,
Weihui Jiang,
Tian Jing-fen,
Lixing Song,
Xiaoli Hu
Publication year - 2000
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.49.173
Subject(s) - crystallization , materials science , carbon nitride , amorphous solid , nitride , auger electron spectroscopy , analytical chemistry (journal) , sputter deposition , carbon fibers , chemical engineering , diffraction , auger , sputtering , thin film , crystallography , layer (electronics) , composite material , nanotechnology , chemistry , optics , chromatography , organic chemistry , composite number , engineering , photocatalysis , nuclear physics , catalysis , physics , atomic physics
The amorphous carbon nitride films were prepared by dc magnetron sputtering first and then were heattreated at high temperature.DTA XRD Auger spectroscopy wer e used to study the difference of composition structure before and after heatt reatment.The results showed that crystallization occurred at 1186℃.Heattreatm ent can induce the crystallization of carbon nitride and the diffraction peaks a ppeared in the XRD pattern.The results of Auger spectroscopy also showed that th ere existed SiCNriched area and the content of N decreased.