Effect of High－Temperature Treatment on the Crystallization of CNx Thin Films | Zendy

Xiao Xingcheng | Zendy; Jiang Wei-Hui | Zendy; Tian Jing-fen | Zendy; Lixing Song | Zendy; HU Xing-Fang | Zendy

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Effect of High－Temperature Treatment on the Crystallization of CNx Thin Films

Author(s) -

Xiao Xingcheng,

Jiang Wei-Hui,

Tian Jing-fen,

Lixing Song,

HU Xing-Fang

Publication year - 2000

Publication title -

acta physica sinica

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.199

H-Index - 47

ISSN - 1000-3290

DOI - 10.7498/aps.49.173

Subject(s) - crystallization , materials science , carbon nitride , amorphous solid , nitride , auger electron spectroscopy , analytical chemistry (journal) , sputter deposition , carbon fibers , chemical engineering , diffraction , auger , sputtering , thin film , crystallography , layer (electronics) , composite material , nanotechnology , chemistry , optics , chromatography , organic chemistry , composite number , engineering , photocatalysis , nuclear physics , catalysis , physics , atomic physics

The amorphous carbon nitride films were prepared by dc magnetron sputtering first　and then were heattreated at high temperature.DTA　XRD　Auger spectroscopy wer e used to study the difference of composition　structure before and after heatt reatment.The results showed that crystallization occurred at 1186℃.Heattreatm ent can induce the crystallization of carbon nitride and the diffraction peaks a ppeared in the XRD pattern.The results of Auger spectroscopy also showed that th ere existed SiCNriched area and the content of N decreased.

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