Open AccessSTUDY OF THE MICROSTRUCTURE OF ALTERNATING C3N4 In CNx/TiN COMPOSITE FILMS PREPARED
Author(s) -
WU Dawei,
Dejun Fu,
Mao Xian-Wei,
Yu Ming-Sheng,
Peng You-gui,
Xuejun Fan
Publication year - 1999
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.48.904
Subject(s) - materials science , x ray photoelectron spectroscopy , amorphous solid , microstructure , thin film , sputter deposition , tin , conversion electron mössbauer spectroscopy , lattice constant , composite number , substrate (aquarium) , diffraction , sputtering , analytical chemistry (journal) , chemical engineering , composite material , optics , nanotechnology , crystallography , mössbauer effect , metallurgy , mössbauer spectroscopy , chemistry , physics , oceanography , chromatography , geology , engineering
We prepared alternating CNx/TiN composite films using a dc magnetron sputtering system in which a closed unbalanced magnetic field was adopted and a negatively biased grating was placed in front of each substrate. The composition of the thin film was analyzed by X-ray photoelectron spectroscopy (XPS). X-ray diffraction (XRD) and transmission electron diffraction (TED) revealed that the CNx films deposited at grating voltages lower than 400V are amorphous. β-C3N4 and subic-C3N4(c-C3N4) were formed at higher voltages. A high grating voltage is indispensable for synthesis of c-C3N4. The lattice constants of C3N4 evaluated from the experimental data agree well with reported theoretical values.