ATOM LITHOGRAPHY | Zendy

Weiquan Cai | Zendy; LI CHUAN-WEN | Zendy; Huo Yunsheng | Zendy; Yuzhu Wang | Zendy

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ATOM LITHOGRAPHY

Author(s) -

Weiquan Cai,

LI CHUAN-WEN,

Huo Yunsheng,

Yuzhu Wang

Publication year - 1999

Publication title -

acta physica sinica

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.199

H-Index - 47

ISSN - 1000-3290

DOI - 10.7498/aps.48.611

Subject(s) - lithography , x ray lithography , materials science , extreme ultraviolet lithography , electronics , nanotechnology , optics , physics , resist , optoelectronics , electrical engineering , engineering , layer (electronics)

A new nanometer lithographic techniqueatom lithography,which is developed based on the principles of laser cooling and trapping of neutral atomsthe newest achievements of quantum optics,has been reviewed.The working principles,the overall schemes,the individual techniques and the acquired results are described.This new method has been compared with the existing micro-lithographic techniques,and the application potentialities in the micro-electronics and other fields have been discussed.

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