Open AccessATOM LITHOGRAPHY
Author(s) -
蔡惟泉,
李传文,
霍芸生,
王育竹
Publication year - 1999
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.48.611
Subject(s) - lithography , x ray lithography , materials science , extreme ultraviolet lithography , electronics , nanotechnology , optics , physics , resist , optoelectronics , electrical engineering , engineering , layer (electronics)
A new nanometer lithographic techniqueatom lithography,which is developed based on the principles of laser cooling and trapping of neutral atomsthe newest achievements of quantum optics,has been reviewed.The working principles,the overall schemes,the individual techniques and the acquired results are described.This new method has been compared with the existing micro-lithographic techniques,and the application potentialities in the micro-electronics and other fields have been discussed.