Open AccessA RADOM MODEL OF THIN FILM GROWTH
Author(s) -
Liu Zu-Li,
Huiling Wei,
Hanwen Wang,
Wang Jun-Zhen
Publication year - 1999
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.48.1302
Subject(s) - computer science , materials science
The relationship between temperature of substrate and island morphology at the early phase of thin film growth has been investigated using Monte Carlo model. The relationship between island morphology and rest energy of vapor phase particles has also been obtained. Three kinds of dynamic processes, i.e.adsorption, diffusion and desorption are considered. The difference between our model and the previous one is that the impingement is considered to be independent of other processes, and the diffusion and desorption are correlated with each other. The results indicate that with increasing temperature, the island morphology evolves from dispersed growth, fractal growth to dense growth. At low temperatures, with increasing energy of vapor phase particles, the same evolution of island morphology is also observed.