Open AccessAMORPHIZATION REACTION PROCESS IN Ni/AMORPHOUS Si MULTILAYER
Author(s) -
Weihua Wang,
Bai Hai-Yang,
Wenkui Wang
Publication year - 1998
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.47.1149
Subject(s) - amorphous solid , materials science , diffraction , amorphous metal , solid state , kinetic energy , chemical engineering , thermodynamics , crystallography , chemistry , optics , physics , quantum mechanics , engineering
Solid state amorphization reaction process in Ni/amorphous Si multilayers has been quanlitatively studied by using in situ X-ray diffraction. An amorphous formation and growth model is suggested for elucidating the solid state reaction in the Ni/amorphous Si multilayers. Thermodynamic and kinetic interpretations for the amorphization reaction at grain boundaries in Ni sublayers are presented.