AMORPHIZATION REACTION PROCESS IN Ni/AMORPHOUS Si MULTILAYER | Zendy

Weihua Wang | Zendy; Bai Hai-Yang | Zendy; Wenkui Wang | Zendy

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AMORPHIZATION REACTION PROCESS IN Ni/AMORPHOUS Si MULTILAYER

Author(s) -

Weihua Wang,

Bai Hai-Yang,

Wenkui Wang

Publication year - 1998

Publication title -

acta physica sinica

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.199

H-Index - 47

ISSN - 1000-3290

DOI - 10.7498/aps.47.1149

Subject(s) - amorphous solid , materials science , diffraction , amorphous metal , solid state , kinetic energy , chemical engineering , thermodynamics , crystallography , chemistry , optics , physics , quantum mechanics , engineering

Solid state amorphization reaction process in Ni/amorphous Si multilayers has been quanlitatively studied by using in situ X-ray diffraction. An amorphous formation and growth model is suggested for elucidating the solid state reaction in the Ni/amorphous Si multilayers. Thermodynamic and kinetic interpretations for the amorphization reaction at grain boundaries in Ni sublayers are presented.

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