INVESTIGATION OF Na/Si(111)3×1 SURFACE STRUCTURE USING NEXAFS
Author(s) -
FAN CHAO-YANG,
ZHANG XUN-SHENG,
TANG JING-CHANG,
SUI HUA,
XU YA-BO,
XU SHI-HONG,
Pan Hai-bin,
Pengshou Xu
Publication year - 1997
Publication title -
acta physica sinica
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.46.953
Subject(s) - xanes , materials science , synchrotron radiation , extended x ray absorption fine structure , absorption (acoustics) , atom (system on chip) , scattering , cluster (spacecraft) , bond length , x ray absorption fine structure , atomic physics , molecular physics , analytical chemistry (journal) , crystallography , absorption spectroscopy , crystal structure , optics , spectral line , chemistry , spectroscopy , physics , programming language , chromatography , quantum mechanics , astronomy , computer science , composite material , embedded system
The investigation of the near-edge X-ray absorption fine structure(NEXAFS) of Na-induced Si(111)3×1 surface structure using the secondary electron partial yield method with synchrotron radiation is reported. Comparing the possible absorption models by the multiple-scattering cluster method, we find that the calculated results by using the Mnch model agree with the experiments.The sodium atom is absorbed on the top site with Na—Si bond length 0.3 nm.
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