Open AccessRAMAN SPECTRO-ANALYSES OF DIAMOND-FILMS DEPOSITED ON ALUMINA CERAMICS
Author(s) -
Yaowu Mo,
Yiben Xia,
Huang Xiao-qin,
Jianhua Ju,
Hong Wang
Publication year - 1997
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.46.618
Subject(s) - diamond , materials science , chemical vapor deposition , wafer , raman spectroscopy , ceramic , carbon film , diffraction , thin film , composite material , analytical chemistry (journal) , optoelectronics , nanotechnology , optics , chemistry , physics , chromatography
Diamond films were alternatively deposited on alumina ceramic wafers by microwave plasma chemical vapor deposition (MPCVD) and hot-filament chemical vapor deposition (MPCVD).The qualities of the deposited diamond films deposited on different wafers with different deposited techniques were appraised by the method of fitting the spectra, and the domain size and strain of the films were calculated.The results of calculation were consistence with that derived from the X-ray diffraction analyses.