Open AccessSTRUCTURE AND CHARACTERISTICS OF C3N4 THIN FILMS
Author(s) -
WU Dawei,
He Meng-Bing,
Guo Huaixi,
Luo Hai-lin,
Zhihong Zhang,
FU Dejun,
Xuejun Fan
Publication year - 1997
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.46.530
Subject(s) - materials science , x ray photoelectron spectroscopy , thin film , carbon film , carbon nitride , chemical vapor deposition , fourier transform infrared spectroscopy , graphite , analytical chemistry (journal) , nitrogen , nitride , diffraction , carbon fibers , chemical engineering , composite material , nanotechnology , optics , layer (electronics) , chemistry , composite number , biochemistry , physics , chromatography , photocatalysis , catalysis , organic chemistry , engineering
Nitride carbon thin films have been deposited by plasma-enhanced chemical vapor phase deposition. The results of transmission-electron diffraction indicated that films have polycrystal structures. Carbon and nitrogen atoms binding energies and the nitrogen content of the-films are measured out by X-ray photoelectron spectroscopy.The Fourier transform infrared spectrum show that there is no graphite phase in the films,and the Vickers hardness of the films vary from 29.2 to 50.0GPa.