FIELD EMISSION FROM AMORPHOUS DIAMOND FILMS | Zendy

Jianping Zhao | Zendy; Xi Wang | Zendy; Chen Zhiying | Zendy; YANG SHI-QI | Zendy; Xianghuai Liu | Zendy; Shi Tiansheng | Zendy

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FIELD EMISSION FROM AMORPHOUS DIAMOND FILMS

Author(s) -

Jianping Zhao,

Xi Wang,

Chen Zhiying,

YANG SHI-QI,

Xianghuai Liu,

Shi Tiansheng

Publication year - 1997

Publication title -

acta physica sinica

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.199

H-Index - 47

ISSN - 1000-3290

DOI - 10.7498/aps.46.1444

Subject(s) - field electron emission , work function , materials science , diamond , amorphous solid , field (mathematics) , arc (geometry) , electron , vacuum arc , carbon film , optoelectronics , thin film , nanotechnology , condensed matter physics , composite material , physics , plasma , crystallography , chemistry , mathematics , geometry , layer (electronics) , quantum mechanics , pure mathematics

One new diamond form,the amorphous diamond (a-D) film,is prepared by filtered arc deposition.The field emission properties and mechanism of a-D film are presented,to our knowledge,for the first time.The field emission current of more than 20μA is detected below a field intensity of 20V/μm. This result is even superior to all previously reported results.The Fowler-Nordheim field- emission behavior has been observed in a-D films.The a-D films have a low work function and negative- electron affinity.

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