Open AccessFIELD EMISSION FROM AMORPHOUS DIAMOND FILMS
Author(s) -
Zhao Jian-Ping,
Xi Wang,
Zhiying Chen,
Linjun Yang,
Xianghuai Liu,
Shi Tiansheng
Publication year - 1997
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.46.1444
Subject(s) - field electron emission , work function , materials science , diamond , amorphous solid , field (mathematics) , arc (geometry) , electron , vacuum arc , carbon film , optoelectronics , thin film , nanotechnology , condensed matter physics , composite material , physics , plasma , crystallography , chemistry , mathematics , geometry , layer (electronics) , quantum mechanics , pure mathematics
One new diamond form,the amorphous diamond (a-D) film,is prepared by filtered arc deposition.The field emission properties and mechanism of a-D film are presented,to our knowledge,for the first time.The field emission current of more than 20μA is detected below a field intensity of 20V/μm. This result is even superior to all previously reported results.The Fowler-Nordheim field- emission behavior has been observed in a-D films.The a-D films have a low work function and negative- electron affinity.