Open AccessVISIBLE ELECTROLUMINESCENCE FROM SILICONNANOCRYSTALLITES PREPARED BY PLASMAENHANCED CHEMICAL VAPOR DEPOSITION
Author(s) -
Tong Su,
Liu Xiangna,
LuChun Wang,
Y. Feng,
Xiaoguang Bao
Publication year - 1997
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.46.1217
Subject(s) - electroluminescence , chemical vapor deposition , materials science , plasma enhanced chemical vapor deposition , spectral line , silicon , conductivity , optoelectronics , thermal conduction , deposition (geology) , analytical chemistry (journal) , nanotechnology , chemistry , composite material , physics , chromatography , paleontology , layer (electronics) , astronomy , sediment , biology
We have observed visible electroluminescence (EL) from silicon nanocrystallites which are embedded in a-Si∶H films prepared in a plasma enhanced chemical vapor deposition system. The EL spectra are in the range of 500nm to 850nm with two peaks located at about 630—680nm and 730nm respectively. We found that the intensity of EL peaks is related closely to the conductivity of the deposited films. The carrier conduction path is discussed in terms of the material structural- characteristics, and a tentative explanation of the light emission mechanism is proposed.