Open AccessELECTRIC BREAKDOWN OF PERCOLATION SYSTEM OF 2D METAL FILM ON FULLERENE UNDERLAYER
Author(s) -
Ke Wu,
Wu Jun-Qiao,
Zhijun Wang,
Jinlong Zhang,
Chuanyi Li,
Yin Dao-Le,
Zhennan Gu,
Zhou Xi-Huang,
Jin Zhaoxia
Publication year - 1996
Publication title -
wuli xuebao
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.199
H-Index - 47
ISSN - 1000-3290
DOI - 10.7498/aps.45.1905
Subject(s) - materials science , fullerene , percolation (cognitive psychology) , percolation threshold , condensed matter physics , metal , substrate (aquarium) , electrical resistance and conductance , epitaxy , composite material , electrical resistivity and conductivity , layer (electronics) , metallurgy , chemistry , physics , neuroscience , biology , oceanography , organic chemistry , engineering , geology , electrical engineering
Fullerene and 7films were epitaxially grown on fresh (001) mica fcc closely-packed plane parallel to the substrate surface. Metal-overlayers were deposited onto these fullerene films in an ultra-hight-vacuum(UHV) chamber and in situ resistance measurements were performed. With increasing current, we observed reversible resistance variation and irreversible breakdown. Nera the percolation threshold we find power law scaling behavior bα,where b is breakdown current and R the sample resistance. The exponent α is much smaller than the values given by previous experiments and prediction of conventional --(NLB) model. Possible explanation of these phenomena based on metal-fullerene interfacial interactions is discussed.